ULTRA-FAST, HIGH POWER ANALYSIS OF MICRO-ARCING
Reducing Waste, Improving Yields and Increasing Throughput
The INFICON Sion™ RF Detector provides real-time, high-power analyses of plasma micro-arcing which can cause damage to the target, the film being deposited, and even the panel surface in c-Si edge etch processing. More compact than any other device on the market, Sion employs the INFICON FabGuard® Integration and Analysis System to detect arcs that were previously undetectable. The result is reduced losses, improved yields faster throughput and increased profitability.
Features at a Glance
· non-intrusive ultra-small detector design
· high-speed data collection (20 KHz)
· integrated data management with FabGuard
Small Easy Clamp-on Sensor Equals Huge Advantage
Sion's performance isn't hampered as are inline cable mount sensors; it doesn't change the tool's RF delivery system characteristics. The innovative clamp-on design is an extremely compact, non-intrusive detector which connects directly to the process chamber's high-power RF delivery system to collect voltage and current information at speeds up to 20 KHz. This includes a high-speed signal converter connecting directly to the FabGuard data collection and analysis system.
Other devices cannot compete with the performance of the Sion RF Detector, because large RF detectors must be squeezed into locations which allow only inadequate arc detection.
Applications
Arc detection for c-Si Edge etch applications.
Arc detection for a-Si /μc-Si PECVD applications.
Arc detection for SiN PECVD applications.
ASSOCIATED TECHNICAL INFORMATION
Brochures and Datasheets:
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Brochure - Sion Plasma Arc Detector
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